{"id":10877,"date":"2023-06-11T14:45:27","date_gmt":"2023-06-11T12:45:27","guid":{"rendered":"https:\/\/sglux.de\/2023-towards-sic-based-vuv-pin-photodiodes-investigations-on-4h-sic-photodiodes-with-shallow-implanted-al-emitters\/"},"modified":"2025-06-11T15:17:15","modified_gmt":"2025-06-11T13:17:15","slug":"2023-towards-sic-based-vuv-pin-photodiodes-investigations-on-4h-sic-photodiodes-with-shallow-implanted-al-emitters","status":"publish","type":"post","link":"https:\/\/sglux.de\/fr\/2023-towards-sic-based-vuv-pin-photodiodes-investigations-on-4h-sic-photodiodes-with-shallow-implanted-al-emitters\/","title":{"rendered":"2023 &#8211; Towards Sic-Based VUV Pin-Photodiodes &#8211; Investigations on 4H-SiC Photodiodes with Shallow Implanted Al Emitters"},"content":{"rendered":"<p>Michael Schraml\u00b9, Alexander May\u00b9, Dr. Tobias Erlbacher\u00b9, Dr. Niklas Papathanasiou\u00b2, Dr. Tilman Weiss\u00b2,<br \/>\n\u00b9Fraunhofer IISB, Erlangen, Germany<br \/>\n\u00b2sglux GmbH, Berlin, Germany<\/p>\n<p><strong><a href=\"https:\/\/www.scientific.net\/KEM.947.77\" target=\"_blank\" rel=\"noopener noreferrer\">Towards SiC-Based VUV Pin-Photodiodes &#8211; Investigations on 4H-SiC Photodiodes with Shallow Implanted Al Emitters<\/a><\/strong><\/p>\n<p align=\"justify\"><em>Zusammenfassung<\/em><br \/>\n4H silicon carbide (SiC) based pin photodiodes with a sensitivity in the vacuum ultraviolet spectrum (VUV) demand newly developed emitter doping profiles. This work features the first ever reported 4H-SiC pin photodiodes with an implanted p-emitter and a noticeable sensitivity at a wavelength of 200 nm. As a first step, Aluminum doping profiles produced by low energy ion implantation in 4H-SiC were characterized by secondary-ion mass spectrometry (SIMS). Photodiodes using these shallow emitters are compared to one with a deep p-emitter doping profile employing IV characteristics and the spectral response. SIMS results demonstrate the possibility of shallow Alimplantation profiles using low implantation energies with all emitter profiles featuring characteristic I-V results. For some shallow doping profiles, a meassurable signal at the upper limit of the VUV spectrum could be demonstrated, paving the way towards 4H-SiC pin photodiodes with sensitivities for wavelengths below 200 nm.<\/p>\n","protected":false},"excerpt":{"rendered":"<p>Michael Schraml\u00b9, Alexander May\u00b9, Dr. Tobias Erlbacher\u00b9, Dr. Niklas Papathanasiou\u00b2, Dr. Tilman Weiss\u00b2,<br \/>\n\u00b9Fraunhofer IISB, Erlangen, Germany<br \/>\n\u00b2sglux GmbH, Berlin, Germany<\/p>\n<p><strong><a href=\"https:\/\/www.scientific.net\/KEM.947.77\" target=\"_blank\" rel=\"noopener noreferrer\">Towards SiC-Based VUV Pin-Photodiodes &#8211; Investigations on 4H-SiC Photodiodes with Shallow Implanted Al Emitters<\/a><\/strong><\/p>\n<p align=\"justify\"><em>Zusammenfassung<\/em><br \/>\n4H silicon carbide (SiC) based pin photodiodes with a sensitivity in the vacuum ultraviolet spectrum (VUV) demand newly developed emitter doping profiles. This work features the first ever reported 4H-SiC pin photodiodes with an implanted p-emitter and a noticeable sensitivity at a wavelength of 200 nm. As a first step, Aluminum doping profiles produced by low energy ion implantation in 4H-SiC were characterized by secondary-ion mass spectrometry (SIMS). Photodiodes using these shallow emitters are compared to one with a deep p-emitter doping profile employing IV characteristics and the spectral response. SIMS results demonstrate the possibility of shallow Alimplantation profiles using low implantation energies with all emitter profiles featuring characteristic I-V results. For some shallow doping profiles, a meassurable signal at the upper limit of the VUV spectrum could be demonstrated, paving the way towards 4H-SiC pin photodiodes with sensitivities for wavelengths below 200 nm.<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"_genesis_hide_title":false,"_genesis_hide_breadcrumbs":false,"_genesis_hide_singular_image":false,"_genesis_hide_footer_widgets":false,"_genesis_custom_body_class":"","_genesis_custom_post_class":"","_genesis_layout":"","footnotes":""},"categories":[188,499],"tags":[401,421,549,377],"class_list":{"0":"post-10877","1":"post","2":"type-post","3":"status-publish","4":"format-standard","6":"category-recherche-fr","7":"category-publications-fr","8":"tag-flame-fr","9":"tag-irradiance_all-fr","10":"tag-science-fr","11":"tag-vuv-fr","12":"entry"},"acf":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v26.6 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>2023 - Towards Sic-Based VUV Pin-Photodiodes - Investigations on 4H-SiC Photodiodes with Shallow Implanted Al Emitters | sglux<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/sglux.de\/fr\/2023-towards-sic-based-vuv-pin-photodiodes-investigations-on-4h-sic-photodiodes-with-shallow-implanted-al-emitters\/\" \/>\n<meta property=\"og:locale\" content=\"fr_FR\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"2023 - Towards Sic-Based VUV Pin-Photodiodes - Investigations on 4H-SiC Photodiodes with Shallow Implanted Al Emitters | sglux\" \/>\n<meta property=\"og:description\" content=\"Michael Schraml\u00b9, Alexander May\u00b9, Dr. Tobias Erlbacher\u00b9, Dr. Niklas Papathanasiou\u00b2, Dr. Tilman Weiss\u00b2, \u00b9Fraunhofer IISB, Erlangen, Germany \u00b2sglux GmbH, Berlin, Germany  Towards SiC-Based VUV Pin-Photodiodes - Investigations on 4H-SiC Photodiodes with Shallow Implanted Al Emitters Zusammenfassung 4H silicon carbide (SiC) based pin photodiodes with a sensitivity in the vacuum ultraviolet spectrum (VUV) demand newly developed emitter doping profiles. This work features the first ever reported 4H-SiC pin photodiodes with an implanted p-emitter and a noticeable sensitivity at a wavelength of 200 nm. As a first step, Aluminum doping profiles produced by low energy ion implantation in 4H-SiC were characterized by secondary-ion mass spectrometry (SIMS). Photodiodes using these shallow emitters are compared to one with a deep p-emitter doping profile employing IV characteristics and the spectral response. SIMS results demonstrate the possibility of shallow Alimplantation profiles using low implantation energies with all emitter profiles featuring characteristic I-V results. 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